Our Mission

We are committed to advancing fundamental science and high-impact processing technologies that enable breakthrough materials and predictive processes for next-generation semiconductor manufacturing.

Chaotic Advection & Nonlinear Fluid Dynamics

We pursue first-principles research in theoretical fluid dynamics, focusing on chaotic advection, Lagrangian transport, and nonlinear flow instability.
By identifying coherent structures, transport barriers, and strange attractors, we establish a fundamental theoretical framework for understanding mixing, transport, and reaction in complex flows.

Data-Driven Modeling & Machine Learning

We believe data is not a replacement for theory, but a lens to reveal it.
Our research combines physics-based computation and machine learning to extract governing patterns, reduced representations, and surrogate dynamics, enabling interpretable and predictive modeling of complex material and flow systems.

Spectral Element Method–Based High-Accuracy CFD

We develop high-order computational fluid dynamics grounded in numerical analysis and continuum mechanics. By advancing the Spectral Element Method, our research combines geometric flexibility with spectral-level accuracy, enabling the faithful resolution of multiscale transport phenomena, sharp interfaces, and nonlinear flow dynamics in complex systems.

News

Research

Project

Ongoing + Completed +

Publications

Insights into Tri-silane induced surface reactions on silicon: A first-principles stud

Ho Jun Kim, Yunseok Kim, Hwanyeol Park
15 April 2026
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Elucidating the super-cycle mechanism in atomic layer growth of HfAlOx ternary metal oxide from an ab-initio study

Yunseok Kim, Seulwon Choi, Ho Jun Kim, Hwanyeol Park
01 April 2026
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Turbulent Flow-Induced Vortex Formation and Nonlinear Spatial Behavior Influencing Nanoparticle Mixing in Thermal Plasma Reactors

. Cheongbin Cheon, Min Young Hur, Donggeun Lee, Sangsun Yang, Ho Jun Kim, Hae June Lee
08 March 2026
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Multiscale computational fluid dynamics modelling of spatial atomic layer deposition processes: Application to chamber design and process control

Yunseok Kim; Seulwon Choi, Huichan Kang; Ho Jun Kim, Hwanyeol Park
01 March 2026
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Stagnation point flow analysis in an inductively coupled plasma reactor for advanced deposition techniques

Chanyeong Jeong, Sanghyun Jo, Ho Jun Kim
01 February 2026
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