CSPP Laboratory

39

Numerical optimization of dielectric properties to achieve process uniformity in capacitively coupled plasma reactors

Author : Ho Jun Kim, Kyungjun Lee, Hwanyeol Park

Date : 22 January 2024

Impact Factor : 3.3 (2024)

Rank : 7/41 (PHYSICS, FLUIDS & PLASMAS)

Link
38

Effect of dilution gas on the distribution characteristics of capacitively coupled plasma by comparing SiH4/He and SiH4/Ar

Author : Ho Jun Kim, Kyungjun Lee, Hwanyeol Park

Date : 07 November 2023

Impact Factor : 3.3 (2024)

Rank : 7/41 (PHYSICS, FLUIDS & PLASMAS)

Link
37

Dry wear behavior of identical tetrahedral amorphous carbon nanofilms on sintered composites and metal substrate with varying load bearing capacities

Author : Seongmin Kang, Sangyul Ha, Kihwan Kim, Yurim Lee, Young-Jun Jang, Jongkuk Kim, Kyungjun Lee, Ho Jun Kim

Date : 11 September 2023

Impact Factor : 6.6 (2024)

Rank : 10/97 (METALLURGY & METALLURGICAL ENGINEERING)

Link
36

Self-cleaning mechanisms according to the wettability of the surface and deposition material

Author : Kihwan Kim, Hong Ryul Park, Ho Jun Kim, Deaho Lee, Sangyul Ha, Kyungjun Lee, Woonbong Hwang

Date : 30 July 2023

Impact Factor : 6.9 (2024)

Rank : 3/24 (MATERIALS SCIENCE, COATINGS & FILMS)

Link
35

Combined simulation of micro and nanoparticles in RF inductively coupled plasma torches with the variations of metallic species and feeding nozzle location

Author : Cheongbin Cheon, Ho Jun Kim, Hae June Lee

Date : 14 November 2022

Impact Factor : 1.8 (2024)

Rank : 138/187 (PHYSICS, APPLIED)

Link
34

First-Principles Investigation of Morphological Evolution of Tungsten Growth on Alumina Surfaces: Implications for Thin-Film Growth

Author : Hwanyeol Park, Dong-Hoon Han, Hong Taek Lim, Woojin Choi, Ho Jun Kim

Date : 21 October 2022

Impact Factor : 5.5 (2024)

Rank : 136/461 (MATERIALS SCIENCE, MULTIDISCIPLINARY)

Link
33

Helium Metastable Distributions and Their Effect on the Uniformity of Hydrogenated Amorphous Silicon Depositions in He/SiH4 Capacitively Coupled Plasmas

Author : Sanghyun Jo, Suik Kang, Kyungjun Lee, Ho Jun Kim

Date : 15 September 2022

Impact Factor : 2.8 (2024)

Rank : 12/24 (MATERIALS SCIENCE, COATINGS & FILMS)

Link
32

Importance of higher‐level excited species in argon remote plasma sources: Numerical modeling with consideration of detailed chemical reaction pathways

Author : Cheongbin Cheon, Jung Hwan Yoon, Sanghyun Jo, Ho Jun Kim, Hae June Lee

Date : 24 March 2022

Impact Factor : 2.9 (2024)

Rank : 9/41 (PHYSICS, FLUIDS & PLASMAS)

Link
31

Outside Front Cover: Plasma Process. Polym. 6/2022

Author : Cheongbin Cheon, Jung Hwan Yoon, Sanghyun Jo, Ho Jun Kim, Hae June Lee

Date : 03 June 2022

Impact Factor : 2.9 (2024)

Rank : 9/41 (PHYSICS, FLUIDS & PLASMAS)

Link
30

Importance of Dielectric Elements for Attaining Process Uniformity in Capacitively Coupled Plasma Deposition Reactors

Author : Ho Jun Kim

Date : 28 March 2022

Impact Factor : 2.8 (2024)

Rank : 12/24 (MATERIALS SCIENCE, COATINGS & FILMS)

Link
29

Kinetic Analysis of Electrode Heating Effects in a Torr-Regime Capacitively Coupled Plasma Reactor: 2-D Particle-in-Cell Simulation Study

Author : Geonwoo Park, Jin Seok Kim, Chang Ho Kim, Ho Jun Kim, Hae June Lee

Date : 31 January 2022

Impact Factor : 1.5 (2024)

Rank : 29/41 (PHYSICS, FLUIDS & PLASMAS)

Link
28

Effects of Quenching Gas Feeding on Silver Nanoparticle Synthesis by the Inductively Coupled Plasma Torch

Author : Cheongbin Cheon, Min Young Hur, Ho Jun Kim, Hae June Lee

Date : 23 November 2021

Impact Factor : 1.5 (2024)

Rank : 29/41 (PHYSICS, FLUIDS & PLASMAS)

Link
27

Theoretical Analysis of Si2H6 Adsorption on Hydrogenated Silicon Surfaces for Fast Deposition Using Intermediate Pressure SiH4 Capacitively Coupled Plasma

Author : Hwanyeol Park, Ho Jun Kim

Date : 21 August 2021

Impact Factor : 2.8 (2024)

Rank : 12/24 (MATERIALS SCIENCE, COATINGS & FILMS)

Link
26

Computational Fluid Dynamics Analysis of Particle Deposition Induced by a Showerhead Electrode in a Capacitively Coupled Plasma Reactor

Author : Ho Jun Kim, Jung Hwan Yoon

Date : 21 August 2021

Impact Factor : 2.8 (2024)

Rank : 12/24 (MATERIALS SCIENCE, COATINGS & FILMS)

Link
25

Enhancement of Cleanliness and Deposition Rate by Understanding the Multiple Roles of the Showerhead Electrode in a Capacitively Coupled Plasma Reactor

Author : Ho Jun Kim

Date : 21 August 2021

Impact Factor : 2.8 (2024)

Rank : 12/24 (MATERIALS SCIENCE, COATINGS & FILMS)

Link

페이징

Publications

Publications

Published

Numerical optimization of dielectric properties to achieve process uniformity in capacitively coupled plasma reactors

Effect of dilution gas on the distribution characteristics of capacitively coupled plasma by comparing SiH4/He and SiH4/Ar

Dry wear behavior of identical tetrahedral amorphous carbon nanofilms on sintered composites and metal substrate with varying load bearing capacities

Self-cleaning mechanisms according to the wettability of the surface and deposition material

Combined simulation of micro and nanoparticles in RF inductively coupled plasma torches with the variations of metallic species and feeding nozzle location

First-Principles Investigation of Morphological Evolution of Tungsten Growth on Alumina Surfaces: Implications for Thin-Film Growth

Helium Metastable Distributions and Their Effect on the Uniformity of Hydrogenated Amorphous Silicon Depositions in He/SiH4 Capacitively Coupled Plasmas

Importance of higher‐level excited species in argon remote plasma sources: Numerical modeling with consideration of detailed chemical reaction pathways

Outside Front Cover: Plasma Process. Polym. 6/2022

Importance of Dielectric Elements for Attaining Process Uniformity in Capacitively Coupled Plasma Deposition Reactors

Kinetic Analysis of Electrode Heating Effects in a Torr-Regime Capacitively Coupled Plasma Reactor: 2-D Particle-in-Cell Simulation Study

Effects of Quenching Gas Feeding on Silver Nanoparticle Synthesis by the Inductively Coupled Plasma Torch

Theoretical Analysis of Si2H6 Adsorption on Hydrogenated Silicon Surfaces for Fast Deposition Using Intermediate Pressure SiH4 Capacitively Coupled Plasma

Computational Fluid Dynamics Analysis of Particle Deposition Induced by a Showerhead Electrode in a Capacitively Coupled Plasma Reactor

Enhancement of Cleanliness and Deposition Rate by Understanding the Multiple Roles of the Showerhead Electrode in a Capacitively Coupled Plasma Reactor