CSPP Laboratory

24

Effect of electrode heating on the distribution of the ion production rate in a capacitively coupled plasma deposition reactor in consideration of thermal decomposition

Author : Ho Jun Kim

Date : 01 July 2021

Impact Factor : 3.9 (2024)

Rank : 63/187 (PHYSICS, APPLIED)

Link
23

Influence of the gas pressure in a Torr regime capacitively coupled plasma deposition reactor

Author : Ho Jun Kim

Date : 02 June 2021

Impact Factor : 3.3 (2024)

Rank : 7/41 (PHYSICS, FLUIDS & PLASMAS)

Link
22

Analysis of thermal diffusion effects observed in a capacitively coupled plasma deposition reactor with non-isothermal walls

Author : Ho Jun Kim

Date : 01 May 2021

Impact Factor : 3.9 (2024)

Rank : 63/187 (PHYSICS, APPLIED)

Link
21

The influence of hydrogen concentration in amorphous carbon films on mechanical properties and fluorine penetration: a density functional theory and ab initio molecular dynamics study

Author : Hwanyeol Park, Daekwang Woo, Jong Myeong Lee, Se Jun Park, Sungwoo Lee, Ho Jun Kim, Euijoon Yoon, Gun-Do Lee

Date : 13 February 2020

Impact Factor : 4.6 (2024)

Rank : 76/239 (CHEMISTRY, MULTIDISCIPLINARY)

Link
20

Analysis of surface adsorption kinetics of SiH4 and Si2H6 for deposition of a hydrogenated silicon thin film using intermediate pressure SiH4 plasmas

Author : Hwanyeol Park, Euijoon Yoon, Gun-Do Lee, Ho Jun Kim

Date : 01 December 2019

Impact Factor : 6.9 (2024)

Rank : 3/24 (MATERIALS SCIENCE, COATINGS & FILMS)

Link
19

The ion kinetics at the wafer edge by the variation of geometry and permittivity of the focus ring in capacitively coupled discharges

Author : Jin Seok Kim, Min Young Hur, Ho Jun Kim, Hae June Lee

Date : 16 December 2019

Impact Factor : 2.5 (2024)

Rank : 101/187 (PHYSICS, APPLIED)

Link
18

First principles investigation on energetics, structure, and mechanical properties of amorphous carbon films doped with B, N, and Cl

Author : Hwanyeol Park;,Daekwang Woo, Jong Myeong Lee, Se Jun Park, Sungwoo Lee, Ho Jun Kim, Euijoon Yoon, Gun-Do Lee

Date : 12 December 2019

Impact Factor : 3.9 (2024)

Rank : 25/136 (MULTIDISCIPLINARY SCIENCES)

Link
17

Numerical analysis for optimization of the sidewall conditions in a capacitively coupled plasma deposition reactor

Author : Ho Jun Kim, Jin Seok Kim, Hae June Lee

Date : 01 November 2019

Impact Factor : 2.5 (2024)

Rank : 101/187 (PHYSICS, APPLIED)

Link
16

Effects of nitrogen doping in amorphous carbon layers on the diffusion of fluorine atoms: A first-principles study

Author : Hwanyeol Park, Sungwoo Lee, Ho Jun Kim, Daekwang Woo, Se Jun Park, Jong Myeong Lee, Euijoon Yoon, Gun-Do Lee

Date : 15 April 2019

Impact Factor : 2.5 (2024)

Rank : 101/187 (PHYSICS, APPLIED)

Link
15

Overall reaction mechanism for a full atomic layer deposition cycle of W films on TiN surfaces: first-principles study

Author : Hwanyeol Park, Sungwoo Lee, Ho Jun Kim, Daekwang Woo, Jong Myeong Lee, Euijoon Yoon, Gun-Do Lee

Date : 20 November 2018

Impact Factor : 4.6 (2024)

Rank : 76/239 (CHEMISTRY, MULTIDISCIPLINARY)

Link
14

Numerical Analysis of the Incident Ion Energy and Angle Distribution in the DC Magnetron Sputtering for the Variation of Gas Pressure

Author : Ho Jun Kim

Date : 31 March 2018

Impact Factor : 0.9 (2024)

Rank : 165/187 (PHYSICS, APPLIED)

Link
13

Uniformity control of the deposition rate profile of a-Si:H film by gas velocity and temperature distributions in a capacitively coupled plasma reactor

Author : Ho Jun Kim, Hae June Lee

Date : 19 March 2018

Impact Factor : 2.5 (2024)

Rank : 101/187 (PHYSICS, APPLIED)

Link
12

Advanced PIC-MCC simulation for the investigation of step-ionization effect in intermediate-pressure capacitively coupled plasmas

Author : Jin Seok Kim, Min Young Hur, Chang Ho Kim, Ho Jun Kim, Hae June Lee

Date : 19 February 2018

Impact Factor : 3.2 (2024)

Rank : 71/187 (PHYSICS, APPLIED)

Link
11

Dissociation reaction of B₂H₆ on TiN surfaces during atomic layer deposition: first-principles study

Author : Hwanyeol Park, Sungwoo Lee, Ho Jun Kim, Euijoon Yoon

Date : 08 December 2017

Impact Factor : 4.6 (2024)

Rank : 76/239 (CHEMISTRY, MULTIDISCIPLINARY)

Link
10

Effects of the wall boundary conditions of a showerhead plasma reactor on the uniformity control of RF plasma deposition

Author : Ho Jun Kim, Hae June Lee

Date : 03 August 2017

Impact Factor : 2.5 (2024)

Rank : 101/187 (PHYSICS, APPLIED)

Link

페이징

Publications

Publications

Published

Effect of electrode heating on the distribution of the ion production rate in a capacitively coupled plasma deposition reactor in consideration of thermal decomposition

Influence of the gas pressure in a Torr regime capacitively coupled plasma deposition reactor

Analysis of thermal diffusion effects observed in a capacitively coupled plasma deposition reactor with non-isothermal walls

The influence of hydrogen concentration in amorphous carbon films on mechanical properties and fluorine penetration: a density functional theory and ab initio molecular dynamics study

Analysis of surface adsorption kinetics of SiH4 and Si2H6 for deposition of a hydrogenated silicon thin film using intermediate pressure SiH4 plasmas

The ion kinetics at the wafer edge by the variation of geometry and permittivity of the focus ring in capacitively coupled discharges

First principles investigation on energetics, structure, and mechanical properties of amorphous carbon films doped with B, N, and Cl

Numerical analysis for optimization of the sidewall conditions in a capacitively coupled plasma deposition reactor

Effects of nitrogen doping in amorphous carbon layers on the diffusion of fluorine atoms: A first-principles study

Overall reaction mechanism for a full atomic layer deposition cycle of W films on TiN surfaces: first-principles study

Numerical Analysis of the Incident Ion Energy and Angle Distribution in the DC Magnetron Sputtering for the Variation of Gas Pressure

Uniformity control of the deposition rate profile of a-Si:H film by gas velocity and temperature distributions in a capacitively coupled plasma reactor

Advanced PIC-MCC simulation for the investigation of step-ionization effect in intermediate-pressure capacitively coupled plasmas

Dissociation reaction of B₂H₆ on TiN surfaces during atomic layer deposition: first-principles study

Effects of the wall boundary conditions of a showerhead plasma reactor on the uniformity control of RF plasma deposition

Publications

Publications

Published

Effect of electrode heating on the distribution of the ion production rate in a capacitively coupled plasma deposition reactor in consideration of thermal decomposition

Influence of the gas pressure in a Torr regime capacitively coupled plasma deposition reactor

Analysis of thermal diffusion effects observed in a capacitively coupled plasma deposition reactor with non-isothermal walls

The influence of hydrogen concentration in amorphous carbon films on mechanical properties and fluorine penetration: a density functional theory and ab initio molecular dynamics study

Analysis of surface adsorption kinetics of SiH4 and Si2H6 for deposition of a hydrogenated silicon thin film using intermediate pressure SiH4 plasmas

The ion kinetics at the wafer edge by the variation of geometry and permittivity of the focus ring in capacitively coupled discharges

First principles investigation on energetics, structure, and mechanical properties of amorphous carbon films doped with B, N, and Cl

Numerical analysis for optimization of the sidewall conditions in a capacitively coupled plasma deposition reactor

Effects of nitrogen doping in amorphous carbon layers on the diffusion of fluorine atoms: A first-principles study

Overall reaction mechanism for a full atomic layer deposition cycle of W films on TiN surfaces: first-principles study

Numerical Analysis of the Incident Ion Energy and Angle Distribution in the DC Magnetron Sputtering for the Variation of Gas Pressure

Uniformity control of the deposition rate profile of a-Si:H film by gas velocity and temperature distributions in a capacitively coupled plasma reactor

Advanced PIC-MCC simulation for the investigation of step-ionization effect in intermediate-pressure capacitively coupled plasmas

Dissociation reaction of B2H6 on TiN surfaces during atomic layer deposition: first-principles study

Effects of the wall boundary conditions of a showerhead plasma reactor on the uniformity control of RF plasma deposition

Dissociation reaction of B₂H₆ on TiN surfaces during atomic layer deposition: first-principles study